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12.734  Articles
1 of 1.274 pages  |  10  records  |  more records»
We report about properties of carbon layers doped with Er3+ ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD) and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and thei... see more

This paper deals with the creation of thin surface layers prepared by the Plasma Assisted Chemical Vapour Deposition Method (PACVD). Polished sample surfaces made of tool steel were used. An investigation of the dependence of layer thickness on process du... see more

Plasma sprayed coatings composed of stoichiometric hydroxyapatite have been extensively used to improve integration of metallic implants in the host bone, as hydroxyapatite (HA) is normally regarded as similar to the mineralized phase of bone. However, th... see more

A hollow cathode plasma source has been operated automatically, demonstrating independent control of plasma ion energy and ion current density for plasma ion-assisted electron beam-deposited titania (TiO2). The lanthanum hexaboride hollow cathode design d... see more

In this paper, the growth of GaN:Mn thin films by plasma-assisted metalorganic chemical vapor deposition (PAMOCVD) method is reported. The method used in this study, utilizes a microwave cavity as a cracking cell to produce nitrogen radicals, which in tur... see more

A new hollow cathode sputtering system is used for beam-assisted deposition of thin films on dielectric substrates. A copper target placed at the hollow cathode bottom is uniformly sputtered by argon ions from the glow discharge plasma filling the cathode... see more

Analysis of impurity in powder samples has been made by using metal-assisted laser-induced plasma spectroscopy utilizing a pulsed CO2 laser. Various powders including food powder, supplement powder, baby powder, and medicine powder were employed as sample... see more

A series of pure and copper-doped cobalt oxide films was prepared by plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD). The effect of Cu-doping on the chemical structure and morphology of the deposited films was investigated. Raman and FTIR... see more

The plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD) was used to prepare palladium–based thin films starting with palladium (II) acetylacetonate precursor (Pd(acac)2) mixed with argon (carrier gas). To characterize chemical structure and m... see more

1 of 1.274 pages  |  10  records  |  more records»