ARTICLES

Filter  
Active filters 0
Remove
  

Refine your searches by:

Collections
Technology
Environment
Research
Pure sciences
Public health
Education
Biology
Social Sciences
Economy
Agronomy and forestry
all records (75)

Languages
English
Spanish
Portuguese
German
French

Countries
Indonesia
Brazil
USA
Ukraine
Spain
Colombia
Mexico
Chile
Italy
Cuba
all records (84)

Years
2023
2022
2021
2020
2019
2018
2017
2016
2015
2014
all records (24)

Filter  
 
29.148  Articles
1 of 2.916 pages  |  10  records  |  more records»
In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use ... see more

Hydrogen-free diamond-like carbon (DLC) thin films are attractive for a wide range of industrial applications. One of the challenges related to the use of hard DLC lies in the high intrinsic compressive stresses that limit the film adhesion. Here, we repo... see more

In this survey, the magnetron sputtering with Dc. Pulsed mode was embroiled to deposit TiAlN thin film on AISI 316 as a substrate. All the plasma magnetron parameters were fixed excluding the nitrogen gas ratio which was varied from 10% to 50% with step i... see more

In the present work, thin films of Cr/NiO/Ni are deposited on glass substrates using RF magnetron sputtering technique. The uniformity and homogeneity of the prepared films were controlled by varying the power of the source, the target-substrate distance ... see more

We report about some properties of erbium and erbium/ytterbium doped gallium nitride (GaN) layers fabricated by magnetron sputtering onsilicon, quartz and Corning glass substrates. For fabricating GaN layers two types of targets were used - gallium in a s... see more

Reactive dual-target DC magnetron sputtering was used to prepare In–Sn oxide thin films with a wide range of compositions. The films were subjected to annealing post-treatment at 400 °C or 500 °C for different periods of time. Compositional and structural... see more

Reactive magnetron sputtering was used to deposit tantalum nitride (Ta–N) thin films on Si substrate. The effect of varying the N2 percentage in the N2/Ar gas mixture on the Ta–N film characteristics was investigated. Mechanical and tribological propertie... see more

We report the self-buckling (or peeling off) of cubic Cu3N films deposited by DC magnetron sputtering of a Cu target in a nitrogen environment at a gas pressure of 1 Pa. The deposited layer partially peels off as it is exposed to ambient air at atmospheri... see more

Molybdenum Trioxide (MoO3) films are grown on Si(100) substrates by reactive RF magnetron sputtering in plasma containing a mixture of Argon and Oxygen, using a pure Molybdenum target. In this paper, we report the deposition of (MoO3) films on Si(100) sub... see more

1 of 2.916 pages  |  10  records  |  more records»